Remove particles from a minimum of 0.1μm! For cleaning semiconductor wafers and more.
This product is a high-frequency ultrasonic cleaning treatment system that removes dust from fine uneven surfaces using ultrasonic waves. It can be used for cleaning semiconductor wafers, masks, and more. We offer a lineup of nozzle injection type, immersion type, and other cleaning treatment systems. 【Features】 - Removes dust from fine uneven surfaces using ultrasonic waves - Equipped with transducers ranging from 400 kHz to 5 MHz - Removes particles as small as 0.1 μm - Offers a lineup including nozzle injection type and immersion type *For more details, please refer to the PDF materials or feel free to contact us.
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【Examples of Cleaning Targets】 ■ Semiconductor Wafers ■ Masks ■ LCDs ■ Substrates ■ MEMS ■ Solar-related ■ Microstructure Components *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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We offer a selection of small motors (minimum outer diameter 1.9mmφ). We sell motors individually. We also have motors available that can be used in a vacuum.