Substrate heating above 800℃ and reactive film formation are possible! A pulsed laser deposition system that enables high-efficiency and high-quality film formation.
The "GLAZE Series" is a state-of-the-art pulsed laser deposition system for thin film formation. It enables high-efficiency and high-quality film deposition through a hybrid process. It allows for substrate heating above 800°C and reactive film deposition, and it can also be equipped with a magnetron cathode. 【Features】 ■ State-of-the-art pulsed laser deposition system for thin film formation ■ High-efficiency and high-quality film deposition through a hybrid process ■ Substrate heating above 800°C and reactive film deposition possible ■ Magnetron cathode can also be installed *For more details, please refer to the PDF document or feel free to contact us.
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Our company website features information on used equipment related to FPD and semiconductors. ● Main Business Activities Purchase of used semiconductor manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for semiconductor manufacturing lines Purchase of used FPD manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for FPD manufacturing lines Contract development, manufacturing, and sales of semiconductor manufacturing equipment and FPD manufacturing equipment Sales of various equipment parts Agency sales of overseas manufactured equipment
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