Multi-purpose thin film formation is possible! The substrate can be heated up to 950°C with a conductive heater.
The "Pioneer 120 PLD System" is a PLD (Pulsed Laser Deposition) device. It is a standard device that supports substrate sizes of 1 inch and 2 inches in diameter, and it can heat substrates up to 950°C using a conductive heater. Additionally, it can quickly evaporate the desired material using a pulsed laser (with a pulse width of less than 20 ns), allowing for the formation of thin films while maintaining their composition. 【Features】 ■ PLD (Pulsed Laser Deposition) - Capable of forming versatile thin films through pulsed laser deposition. ■ Pulsed Laser (with a pulse width of less than 20 ns) - Quickly evaporates the desired material, enabling the formation of thin films while maintaining their composition. *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■ The standard device supports substrate sizes of 1 inch and 2 inches in diameter, and can heat the substrate up to 950°C using a conductive heater. *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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