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  6. Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968

Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968

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last updated:Aug 18, 2025

Tohoku Techno Arch Co., Ltd.
Tohoku Techno Arch Co., Ltd.
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Polycrystalline Heusler alloy film exhibiting performance comparable to that for a single crystal, which can be formed on a flexible substrate

Co-based Heusler alloy such as Co2MnGa or Co2MnAl has attracted attention as candidate materials for high-sensitivity sensor and high-efficiency thermoelectric conversion element thanks to their large anomalous Nernst and Hall effects. In order to realize these excellent properties, it is thought that a single crystalline bulk material or a thin film grown on a single crystalline substrate is necessary. Thus, such single crystalline samples have been produced. Considering that those materials are applied to actual devices, it is necessary that a polycrystalline film, which does not use a single crystalline substrate, shows the property equivalent to those of single crystalline material.  This invention is able to provide a “polycrystalline Heusler alloy thin film" that does not require a single crystalline substrate, while showing the properties of anomalous Hall angle (θAH~7.5%) and anomalous Nernst coefficient (SANE~5μV/K) comparable to a single crystalline thin film. It can promote the control of crystal orientation and the improvement of crystallinity by sandwiching the polycrystalline layer with an insulating AlN layer.

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Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968

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Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968

Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968

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Tohoku Techno Arch Co., Ltd.

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The revenue generated from technology transfer is reinvested as new research funding for universities and researchers, and is utilized to create further research outcomes. To ensure the smooth operation of this cycle, known as the "Intellectual Creation Cycle," we will vigorously promote technology transfer. The types of seeds we handle include patents, know-how, databases, and programs. We have established a collaborative framework by signing basic technology transfer agreements with the following universities (as of June 1, 2025): Tohoku University, Hirosaki University, Iwate University, Akita University, Fukushima University, Yamagata University, Tohoku Gakuin University, Iwate Medical University, Fukushima Medical University, Aizu University, Miyagi University, Hokkaido University, Muroran Institute of Technology, and Showa Medical University.

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