No need for a photomask! It is possible to form ultra-fine patterns below 100nm.
We offer "Electron Beam (EB) Lithography" as a contract service for microfabrication. As the name suggests, EB lithography is a maskless exposure technology that directly draws device patterns without the use of photomasks. Engineers well-versed in EB lithography will carefully listen to your needs and propose solutions that include the surrounding processes as necessary. 【Features】 ■ No photomask required ■ Easy modification of device patterns ■ Capable of forming ultra-fine patterns below 100nm *For more details, please refer to the PDF document or feel free to contact us.
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【Order Process】 1. Specification Meeting 2. Quotation 3. Order Placement 4. Delivery *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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FKD Factory Co., Ltd. will assist you in bringing your ideas to life. "I want to create a new type of device." "I want to advance my research stage and consider new experimental equipment and materials." "I want to independently develop a device and aim for commercialization." We will propose concrete directions based on your spontaneous ideas, drawing from our extensive experience and unique perspective. There are no limitations. We support cutting-edge research and manufacturing with free-thinking creativity.