FKDファクトリ Product Lineup

We offer a one-stop solution for "experimental film-forming materials" used in research and development settings. Each material manufacturer has different areas of expertise, and it is not uncommon for the prices of materials with the same purity and size to vary by more than double. Leveraging our experience in film-forming technology, we collaborate with suppliers who specialize in precious metals, single metals, alloys, and compounds, allowing us to propose film-forming materials at a reasonable level in terms of quality and price. Researchers who are busy with daily research activities can confidently leave the exploration, selection, and purchase of film-forming materials to us. 【Experimental Film-Forming Materials】 ■ Au (Gold) Target ■ Ag (Silver) Target ■ Ta (Tantalum) Target ■ Ga2O3 (Gallium Oxide) Target ■ Pt (Platinum) Wire ■ Au (Gold) Shot *For more details, please download the PDF or feel free to contact us.

• Other experimental consumables

We offer "dry etching processing" as a contract service for microfabrication. We accommodate substrate sizes from small pieces up to 300mm. We support your device development from R&D devices to prototyping and small-scale production. Engineers well-versed in dry etching respond to a variety of requests based on our unique database. 【Features】 - Supports large substrates up to 300mm - Round substrates can be accommodated up to 12 inches in diameter - Policies are determined based on careful hearings by experienced process engineers *For more details, please refer to the PDF materials or feel free to contact us.

• Processing Contract
• Contract manufacturing

The "FRS-HG Series" is a multi-source simultaneous magnetron sputtering device equipped with dual-source/three-source simultaneous sputtering capabilities for research and development. Despite being a fixed type, it features a compact and stylish design. There are three film source introduction ports available, allowing for the installation of film sources that can synergize with sputtering, such as sputtering cathodes and arc plasma deposition sources. 【Features】 - Compact and stylish design despite being a fixed type - Auto-matching is employed for the RF power supply, making discharge operation easy - Simultaneous film deposition with two or three sources allows for fine-tuning of thin film functions and performance *For more details, please refer to the PDF materials or feel free to contact us.

• Sputtering Equipment

The "FDS/FRS Series" is a tabletop magnetron sputtering device for research and development, equipped with the necessary functions. The basic specifications consist of a DC sputter/single cathode/rotary pump configuration for metal thin film sputtering. With expansion options such as RF conversion, additional cathodes, and turbo molecular pump specifications, it is possible to upgrade according to the research stage. 【Features】 ■ Keeps initial introduction costs low while allowing for high performance upgrades later ■ Comes with an MFC for argon in the basic specifications, enabling precise control of gas flow ■ Adopts a deposition-up method to prevent dust from adhering to the sample during film formation ■ Utilizes a high vacuum-sealing SUS chamber despite being a tabletop type *For more details, please refer to the PDF materials or feel free to contact us.

• Sputtering Equipment