Electron beam high-speed drawing system

Clustering makes it possible to achieve 100 WPH. We will perform exposure using the step-and-shot method.

PARAM offers the "Electron Beam High-Speed Drawing System." Our proposed product, utilizing the "Multi-Column Multi-Beam Method," generates a PSB through a multi-beam method consisting of a matrix-formed micro aperture and deflection electrodes, enabling exposure via a step-and-shot method. As a result, higher drawing accuracy is expected compared to the continuous stage movement method. 【Features】 <Multi-Column Multi-Beam Method Multi-axis PSB> ■ Achieves 87 multi-columns with a pitch of 26×33mm ■ Throughput depends on the size and pitch of the drawing pattern: 10–16 WPH ■ Clustering can achieve up to 100 WPH ■ Higher drawing accuracy is expected compared to the continuous stage movement method *For more details, please refer to the PDF document or feel free to contact us.

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