We provide unique resist materials that leverage our proprietary acrylic resin design technology to contribute to the high functionality of advanced devices.
It can be customized to fit your needs and processes. Please feel free to contact us. ■ Photo spacer material - Good patterning properties; line width: 4μm to over 20μm - Thin film compatibility; height: 0.8μm to over 10μm - Low-temperature curing compatibility; firing temperature: ≧120℃ ■ Thick film resist material - Compatible with various shapes; columnar (dot), linear (L/S), lattice, dome-shaped, positive taper, negative taper - Thick film compatibility; height: 10μm to 100μm ■ Micro lens material - High transparency - Low-temperature curing compatibility; firing temperature: ≧100℃ ■ Insulating film material - High chemical resistance, high adhesion, high transparency - Low-temperature curing compatibility; firing temperature: ≧100℃ - Constant temperature and humidity resistance; 85℃/85%RH, 100 V, Ag or Cu wiring board, no change in resistance value for over 500 hours - Flexible compatibility available
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Line up（6）
| Model number | overview |
|---|---|
| GLR Series | Photo spacer material |
| HTR Series | Thick film resist material |
| PML Series | Micro lens material |
| CHN Series | Insulating film material |
| STC Series | Insulating film material for flexible use |
| FCR Series | Photosensitive acrylic material for flexible use |
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Company information
Osaka Organic Chemical Industry Co., Ltd. provides various resin materials that support daily life, based on acrylic acid esters. Our main product, acrylic acid esters, is used as a resin material in a wide range of industrial fields, including paints, inks, adhesives, and electronic materials. Additionally, by utilizing "surface modification and arrangement control" and "high purity" technologies, we are creating new functions and working to expand into new business areas. Moving forward, as a research and development-oriented company, we will continue to offer attractive new products to our customers.