Create a digital twin for a single process simulator in steady mode, hydraulic sizing mode, and dynamic simulation.
Features of AVEVA Process Simulation (APS) 1) Intuitive, easy-to-read, and user-friendly interface 2) Extensive model library 3) High customizability of models 4) Capability to handle both steady-state and transient conditions with a single software 5) Applicability to digital transformation (DX)
Inquire About This Product
basic information
The Plant Digital X Corporation of the Daiichi Jitsugyo Group provides engineering services utilizing AVEVA Process Simulation (APS) as a solution provider for AVEVA. By leveraging APS, we support our customers in various aspects of production activities, from research and development to maintenance. We offer support for conceptual design, case studies, FEED, detailed engineering, startup, and operations.
Price range
Delivery Time
Applications/Examples of results
- Various design tasks for plants - Modeling of Power to X themes such as "water electrolysis" and "CO2 co-electrolysis" - Consideration of carbon neutrality - CAPEX/OPEX calculations - Greenhouse gas calculations - Unsteady simulations - Steady simulations - Others
catalog（3）
Download All Catalogs
Company information
Daiichi Jitsugyo (DJK) is expanding its business centered around seven operations as a supplier of industrial machinery both domestically and internationally. As we recognize the challenges facing the world alongside the realization of a prosperous life through industrial development, we aim to connect the accumulated know-how we have developed to the realization of a sustainable society, supporting global manufacturing with our ability to propose advanced technologies and services that meet diverse needs.
![[Presentation of Japanese Materials] Supporting high-speed and high-precision prediction of physical properties of polymers and resins.](https://image.mono.ipros.com/public/product/image/112/2000688634/IPROS6476045160153877193.jpg?w=280&h=280)
![[Analysis Case] HF Etching Simulation of a-SiO2 Film](https://image.mono.ipros.com/public/product/image/387108/IPROS8431993739759975458.jpg?w=280&h=280)
![[Analysis Case] CO2 Adsorption Simulation on MOF using GCMC Method](https://image.mono.ipros.com/public/product/image/387108/IPROS14031049714373274932.jpg?w=280&h=280)
![[Analysis Case] Vapor Pressure Calculation of Ga-containing Precursor by Molecular Dynamics Simulation](https://image.mono.ipros.com/public/product/image/387108/IPROS13258153585504310688.jpg?w=280&h=280)