It is possible to analyze the film formation process from both macro and micro scales.
The particle method plasma analysis software "Particle-PLUS," developed by Wavefront Inc., can analyze magnetron sputtering even in cases where there are microtrench structures on the substrate. "Particle-PLUS" is capable of simulating the film deposition process by calculating both the macro scale for the entire sputtering device on a substrate that includes microtrench structures and the micro scale for the areas with microtrench. *For more details, please download the PDF or feel free to contact us.*
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basic information
【Specifications】 ■Product Name: Particle-PLUS ■Price Range: Please contact us ■Delivery Time: Please contact us *For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
【Calculable Examples】 ■ Magnetron Sputtering ■ PVD, Plasma CVD ■ Capacitive Coupled Plasma (CCP) ■ Electrophoresis, etc. 【Features】 ■ Specializes in low-pressure plasma analysis ■ Combines axisymmetric models with mirror symmetric boundary conditions to quickly obtain results without simulating the entire device ■ Excels in plasma simulation for low-pressure gases, which are difficult to compute with fluid models ■ Supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, efficiently handling complex models ■ As a strength of our in-house developed software, customization to fit customer devices is also possible *For more details, please download the PDF or feel free to contact us.
catalog（1）
Download All Catalogs![[Case Study] Analysis of Thin Film Formation on Particle-PLUS Microtrench](https://image.mono.ipros.com/public/catalog/image/01/832/774668/IPROS76086230324566525616.jpeg?w=120&h=170)
Company information
Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into one that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend towards digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to enhance operational efficiency. In line with this trend, our company provides a solution aimed at improving efficiency in research and development environments, known as the Laboratory Information Management System (LIMS), which includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.
![[Example] "Particle-PLUS" Counter Target Type Sputtering](https://image.mono.ipros.com/public/product/image/19d/2000545489/IPROS56615479397902732461.png?w=280&h=280)
![[Example] Particle-PLUS DC Magnetron Sputter 3D](https://image.mono.ipros.com/public/product/image/166/2000513026/IPROS34927618300668255606.png?w=280&h=280)
![[Example] Particle-PLUS: RF Magnetron for Dielectric Targets](https://image.mono.ipros.com/public/product/image/fa2/2000679587/IPROS13482455899988853210.jpeg?w=280&h=280)
![[Example] 'Particle-PLUS' RF Magnetron Sputtering](https://image.mono.ipros.com/public/product/image/38d/2000505504/IPROS86185703505494121490.png?w=280&h=280)
