Realizing alternative technologies to SPM technology used in the semiconductor cleaning process!
We would like to introduce a case study on the removal of photoresist in the semiconductor cleaning process using conductive diamond technology. The removal of photoresist is a process that is repeated more than several dozen times per wafer, and until now, it has required a large amount of SPM solution, with waste liquid treatment also being a challenge. The powerful oxidizing ability of electrolytic sulfuric acid can decompose photoresist into carbon dioxide and water, and the reduced sulfuric acid can be circulated and reused as peroxymonosulfuric acid. [Case Overview] ■ Issue: Large amounts of SPM solution required, waste liquid treatment is also a challenge ■ Effect - The powerful oxidizing ability of electrolytic sulfuric acid decomposes photoresist into carbon dioxide and water - The reduced sulfuric acid can be circulated and reused as peroxymonosulfuric acid *For more details, please download the PDF or feel free to contact us.
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Our company is a manufacturer that synthesizes and produces conductive diamonds using CVD. We have conducted research focused on film formation conditions over many years, establishing know-how for durability, high conductivity, and stable film formation over large areas. Diamonds, which possess unique properties such as high hardness, refractive index, thermal conductivity, and chemical stability, are increasingly in demand as materials that can respond to technological advancements and environmental impact reduction. Please feel free to contact us if you have any inquiries.