A next-generation thermal conductive filler that combines high thermal conductivity and chemical stability, featuring a rounded shape that excels in fillability and fluidity.
Silicon carbide (SiC) is a high-performance heat dissipation material that is gaining attention in the field of electronic materials. In addition to its excellent thermal conductivity, it possesses heat resistance, wear resistance, and chemical resistance, demonstrating high effectiveness even in areas where conventional boron nitride and aluminum nitride do not provide sufficient performance. In particular, the rounded SiC filler with beveled edges achieves high fillability and fluidity. It easily disperses uniformly in resins and adhesives, enabling a balance between processability and thermal performance in thermal interface materials (TIM) such as heat dissipation sheets, heat dissipation grease, heat dissipation adhesives, and heat dissipation gap fillers. Furthermore, this rounded shape is expected to reduce stress concentration and contribute to the long-term reliability of components. Applications extend to a wide range of fields where heat management is crucial, including inverters for electric vehicles, onboard power modules, LED substrates, and communication devices. The rounded SiC filler, with its significant potential as a next-generation thermal management material, serves as a powerful solution for development challenges that require both heat dissipation and reliability.
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- Various heat dissipation materials (TIM: Thermal Interface Material) - Heat dissipation sheets, heat dissipation grease, heat dissipation adhesives, heat dissipation gap fillers, sealing materials, etc.
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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.