Chromium (Cr) target Purity>3N8
■Purity: 2N5-3N8 Manufacturing method: HIP ■ High hardness ■ Strong abrasion resistance *For more details, please download the PDF or feel free to contact us.
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basic information
■ HIP process production ■ The actual density can reach 7.12g/cm3 ■ Processing around C0.2-C0.4, or according to customer specified drawings ■ No scratches inside For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
【Main Applications】 ■ Semiconductor and Microelectronics Industry ■ Solar Power Industry ■ Decorative and Protective Coatings ■ Automotive Parts ■ Architecture and Interior Design ■ Industrial Wear-Resistant Coatings ■ Optical and Display Technologies *For more details, please download the PDF or feel free to contact us.
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Company information
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.
