No need for pre-sputtering aimed at preventing oxidation films, allowing for a reduction in labor! This is a sputtering target that also minimizes cracking due to thermal expansion.
We supply Si targets that have reduced cracking through a special manufacturing process. Currently, Si targets are said to have a high incidence of cracking, but our unique manufacturing method can reduce this issue. We also manufacture and sell various other metal materials, oxides, and alloy targets according to customer requests. We can perform bonding processing with new target materials if you provide backing plates. Production is carried out at our affiliated factory in China, allowing us to offer low-cost solutions, while maintaining a production system based on quality standards in Japan. We can also conduct various analyses based on customer requests. 【Available Materials】 Metal Materials: Si, Nb, Ti, Cr, Ta, Al… Oxides: SiO2, Ta2O5, Al2O3, ITO… Alloy Materials: Cu+Ag, Ni+Cr, Ti+Cl… *We also provide introductory materials on the manufacturing process. *For more details, please refer to the PDF document or feel free to contact us.
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USTRON Co., Ltd. is a company that handles deposition materials, target materials, quartz products, and more. The products are produced in our own factory located in China. Compared to cases where products of equivalent prices are outsourced to other companies, we can provide higher quality products at lower costs. If any issues arise after delivery, you can rest assured. We will obtain detailed data from our factory regarding the production of the products. The ability to quickly analyze the cause of any problems is a unique advantage of having our own factory.