Mono-Silicon Target
■Purity>99.99999% ■ Density (2.33/cm ³) *For more details, please download the PDF or feel free to contact us.
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basic information
■ Manufacturing method: SZ method ■ Over 1000mm can be single piece, no need for splicing ■ Can be processed according to the drawings *For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
Main uses: About 100 sets/M of monocrystalline Silicon target are being used for A company's mobile phone chips. ■ Purpose Utilizing materials and technologies for manufacturing integrated circuits (ICs) and large-scale integrated circuits (LSI) Use of necessary thin films as materials for optical processing, solar cells, and other applications Provide parts for electronic devices with multiple colors and manufacturing equipment for liquid crystal manufacturing devices
Company information
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.