We contribute to measures against metal and particle contamination in semiconductor manufacturing.
In the field of research and development, the reproducibility of experiments is extremely important, and the contamination of impurities has a significant impact on experimental results. In the semiconductor manufacturing process, the contamination of metals and particles can lead to degradation of device performance and reduced yield, thus requiring a high level of cleanliness. Our low metal and low particle solutions address these challenges and contribute to improving reliability in research and development. 【Application Scenarios】 - Research and development of semiconductor materials - Evaluation of semiconductor manufacturing processes - Research where metal contamination and particle contamination are issues 【Effects of Implementation】 - Improved reliability of experimental data - Increased efficiency in research and development - Contribution to high-quality semiconductor manufacturing
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basic information
【Features】 - Management of metal concentration at the ppb level - Ability to manage particle counts up to approximately 100nm in diameter - Reduction of metals and particles using adsorbents and filters - Maximum processing capacity of 15L (low metal) and 18L (low particle) - In-house ownership of ICP-MS and liquid particle counters 【Our Strengths】 Fukui Canon Materials Co., Ltd. aims to enhance the comfort of our customers' daily lives through chemical technology, building better relationships between people and between people and chemistry with excellent technology. Under the philosophy of "coexistence," we strive to harmonize environmental sustainability with corporate activities, meeting the expectations of our customers, employees, and local communities. We create products that respond to customer needs through innovative technologies and ideas, aiming for sustainable development.
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Low metalization achievement: Reduced the metal concentration from 2000 ppb to 50 ppb. Low particle achievement: In the circulation filtration of PGMEA (4L), particles larger than 70 nm were reduced from 4687 particles/mL to 0.3 particles/mL in 10 hours.
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Fukui Canon Material Co., Ltd. aims to enhance the comfort of our customers' daily lives through chemical technology, building better relationships between people and between people and chemistry with excellent technology. Under the philosophy of "coexistence," we strive to harmonize the global environment with corporate activities, meet the expectations of our customers, employees, and local communities, and create products that respond to customer needs through innovative technologies and ideas, aiming for sustainable development.
![[Example] Improved cutting performance by preventing blade contamination.](https://image.mono.ipros.com/public/product/image/c4f/2000644218/IPROS54051186879549803023.jpeg?w=280&h=280)
![[Example] Non-stick surface on metal = tape and glue will not adhere.](https://image.mono.ipros.com/public/product/image/94c/2000644550/IPROS96990920943492969297.jpeg?w=280&h=280)
![[Example] Non-stick property on metal surfaces = Prevention of dirt on photomasks](https://image.mono.ipros.com/public/product/image/646/2000645091/IPROS20008530851421665238.jpeg?w=280&h=280)