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  6. Low metal and low particle solutions for semiconductors.

Low metal and low particle solutions for semiconductors.

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last updated:Dec 19, 2025

福井キヤノンマテリアル
福井キヤノンマテリアル
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We contribute to improving the yield in semiconductor manufacturing!

In the semiconductor industry, improving product yield is an important challenge. The contamination of metal impurities and particles during the manufacturing process can lead to a deterioration in product quality and a decrease in yield. Our products address these challenges by using adsorbents and filter technologies to manage metal concentrations at the ppb level and control the number of particles to around 100nm, contributing to improved yield. 【Application Scenarios】 - Purification of semiconductor materials - Particle removal from cleaning solutions - Material management for photoresists and other materials 【Benefits of Implementation】 - Improved yield - Stabilization of product quality - Reduction of defect rates

    Other polymer materials
スクリーンショット

Low metal and low particle solutions for semiconductors.

スクリーンショット 2025-11-04 133459.jpg
スクリーンショット 2025-11-04 133459.jpg
  • About low metalization and low particle generation, click here for more information.
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【Features】 - Adsorbent and filter technology in semiconductor material manufacturing - Management of metal concentration and particle count using ICP-MS and liquid particle counters - Low metal content: maximum processing volume of 15L, quantification limit of 200ppt (PGMEA) - Low particle content: maximum processing volume of 18L, with circulation filtration of PGMEA (4L), reducing particles larger than 70nm from 4687 particles/mL to 0.3 particles/mL in 10 hours 【Our Strengths】 Fukui Canon Materials Co., Ltd. aims to enhance the comfort of our customers' daily lives through chemical technology, building better relationships between people and between people and chemistry with our excellent technology.

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Applications/Examples of results

Low metalization achievement: Reduced the metal concentration from 2000 ppb to 50 ppb. Low particle achievement: In the circulation filtration of PGMEA (4L), particles larger than 70 nm were reduced from 4687 particles/mL to 0.3 particles/mL in 10 hours.

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Fukui Canon Material Co., Ltd. Company Profile

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福井キヤノンマテリアル

福井キヤノンマテリアル

Materials

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Fukui Canon Material Co., Ltd. aims to enhance the comfort of our customers' daily lives through chemical technology, building better relationships between people and between people and chemistry with excellent technology. Under the philosophy of "coexistence," we strive to harmonize the global environment with corporate activities, meet the expectations of our customers, employees, and local communities, and create products that respond to customer needs through innovative technologies and ideas, aiming for sustainable development.

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