Simplex Heater for Semiconductor Film Deposition

Infrared heater that achieves high-efficiency heating even at a distance of 100mm.

In the semiconductor industry's film deposition process, a uniform temperature distribution and precise temperature control are required. In particular, when the distance between the substrate and the heat source increases, heating efficiency decreases, making it easier for temperature variations to occur. These temperature variations can compromise the uniformity of the film deposition and potentially lead to a decline in product quality. The Simplex Heater employs a parallel beam infrared heater module, achieving high-efficiency heating even at a distance of 100mm. This helps suppress temperature variations in the film deposition process and contributes to the stabilization of product quality. 【Application Scenarios】 - Film deposition process - Substrate heating - Measures against temperature variations 【Effects of Implementation】 - Energy savings through improved heating efficiency - Stabilization of the process - Improvement in product quality

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