Introducing a cleaning device that combines disk brush cleaning with chemical cleaning for small-scale production!
We would like to introduce the "Chemical Liquid Scrub Cleaning Device" that we handle. It accommodates work sizes from Φ2" to 12" wafers and square substrates (up to a maximum of 600mm□), and there is no need for setup changes when switching sizes. The work materials include Si, SiC, GaN, GaAs, InP, LT/LN, ceramics, quartz, resin, glass, etc. It is equipped with an automatic correction function that controls the pressing force in 0.1mm increments according to brush wear, and the brush is automatically cleaned before each scrub cleaning. Chemical supply tanks and waste liquid tanks can be built into both sides of the main unit. 【Processing Configuration】 ■ Scrub Cleaning: Surface scrub cleaning with PVA brushes (detergent and pure water cleaning) ■ Spin Cleaning: Two-fluid cleaning, SPM/DHF/SC-1 chemical cleaning (selectable) ■ Rinse Cleaning: MS shower, O3 cleaning (optional) ■ Backside Cleaning: Pure water cleaning ■ Drying: N2 blow drying *For more details, please download the PDF or feel free to contact us.
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【Specifications (Partial)】 ■ Work size: No need for setup changes due to size adjustments ■ Brush pressing pressure: Automatic correction function that controls the pressing force in 0.1mm increments according to brush wear ■ Brush cleaning function ・Automatic cleaning of the brush before scrub cleaning (timing can be set as desired) ・Choose from OF cleaning, shower cleaning, or ultrasonic cleaning ■ Automatic loading with cassette water tank / Compatible with Wet in Dry out *For more details, please download the PDF or feel free to contact us.
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![Connectable even under residual pressure, large-diameter coupling 'TCH' [Fluid Connector]](https://image.mono.ipros.com/public/product/image/7f9/2000775468/IPROS91791548652271380266.png?w=280&h=280)
