A type of photo printing technology! Transferring the pattern of an electronic circuit drawn on a mask to a resist film.
We would like to introduce our technology, the "Lithography Process." In short, photolithography is a type of photographic printing technology. The purpose of photolithography is to transfer the pattern of electronic circuits drawn on a mask onto a resist film. Please feel free to contact us when you need assistance. 【Process (Partial)】 ■ Wafer Preparation ■ Dehydration Bake ■ Resist Coating ■ Prebake ■ Exposure ■ Post-Exposure Bake (PEB) *For more details, please refer to the related links or feel free to contact us.
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【Other Processes】 ■Development ■Post-Bake *For more details, please refer to the related links or feel free to contact us.
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For more details, please refer to the related links or feel free to contact us.
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Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
