Reproducing the process of image formation in the resist on a computer! Efficiently discovering optimal process conditions.
A "Lithography Simulator" is a tool that calculates the behavior of exposure equipment and the behavior of resist (a photosensitive organic material). By inputting parameters from the actual process, it is possible to reproduce the process of image formation in the resist on a computer and efficiently find suitable process conditions. The simulator allows for various settings similar to those in actual lithography processes. 【Optical System Input】 ■Illumination Shape ■Coherence Factor ■Mask Pattern ■Mask Element Attributes ■Numerical Aperture / Focus ■Aberration / Flare *For more details, please refer to the related links or feel free to contact us.
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basic information
【Register Input】 ■Film Thickness ■Refractive Index ■Dill's ABC Parameters ■PEB Temperature ■Acid Diffusion Length ■Others *For more details, please refer to the related links or feel free to contact us.
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Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
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