Spin dryer
Utilizing centrifugal force from rotation, the wafers stored in the cassette enable efficient drying (rinse option). Available in various sizes from small diameter to large diameter, from single cassette tabletop models to four-cassette standalone models. 【Features】 - Compact and small design - High drying capacity ◆ Please refer to the catalog for detailed specifications. ◆
Inquire About This Product
basic information
Utilizing centrifugal force through rotation, it enables efficient drying (rinse option) of wafers stored in the cassette. Available in various sizes from small diameter to large diameter, from single-cassette tabletop models to four-cassette freestanding models. 【Features】 - Compact and small design - High drying capability ◆ Please refer to the catalog for detailed specifications. ◆
Price information
-
Delivery Time
Applications/Examples of results
-
catalog（1）
Download All Catalogs
Company information
We design, manufacture, and sell various types of equipment for both testing and research purposes as well as production automatic devices, including various front-end (photoresist-related) devices and manual spin coaters (for Si, LCD glass, compounds, etc.). [Testing and Research Development, Production Related Equipment for Semiconductors and LCDs] Various cleaning machines (wet, dry), spin coaters, mask aligners, developing and etching equipment, various vacuum devices, probers, and drillers for film thickness measurement, etc.