Vacuum film formation device. Ion-assisted deposition device with a new concept.
【Features】 ● Reduction of operator workload through a new control system ● Shortened production time due to improved exhaust and film formation speed ● Improved film reproducibility with a new optical film thickness gauge and a new monitor glass mechanism ● Achieved a compact layout
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basic information
【Features】 ●Reduction of operator workload through a new control system ●Shortening of production time due to improved exhaust and film formation speed ●Improved film reproducibility with a new optical film thickness gauge and a new monitor glass mechanism ●Achieved a compact layout
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Applications/Examples of results
【Application Examples】 ■ It is optimal as a reflector for light sources that reflect only visible light and allow infrared (heat) rays to pass through well. → Its characteristics include a reflectance of over 90% for visible light and over 80% transmission for infrared (heat) rays above 700nm. ■ It is used for color separation and synthesis purposes. → The dichroic mirror is designed for an incident angle of 45 degrees, which has the advantage of effectively utilizing the transmitted light of a specified color (as well as colors other than the specified color). ■ It reflects ultraviolet and near-infrared rays emitted from the light source while allowing visible light to pass through. → It is used for removal from light-receiving elements such as digital cameras, preventing malfunctions caused by various types of light and degradation due to ultraviolet light. High transmittance and flatness are important. ~ For more details, please download the catalog and refer to it ~
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Company information
Since our establishment, what we have always strived for is to listen to our customers' voices and continue to create products that satisfy them. Fortunately, we have received support from many customers and have been able to achieve a top-class market share in the country, but even after 50 years since our founding, this attitude has not changed. We believe that our increasing attention and exchanges not only from within Japan but also from overseas, particularly in Asia, reflect this understanding. We sincerely seek the ideal form of management and will continue to strive to be a company that can compete internationally in all aspects, including technology, quality, speed, service, and cost performance. In this era where new waves of innovation are constantly emerging, we are determined to evolve further as a comprehensive thin film formation equipment manufacturer, utilizing advanced and sophisticated technologies and being well-versed in all aspects of vacuum thin film formation, driven by an unyielding spirit of challenge.