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  6. "Glass coating 'thin film formation technology' at room temperature and atmospheric pressure [*Technical materials available!]”

"Glass coating 'thin film formation technology' at room temperature and atmospheric pressure [*Technical materials available!]”

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last updated:Jan 20, 2017

魁半導体
魁半導体
  • Official site

Thin film formation at room temperature and atmospheric pressure! Using inexpensive film materials! Immediate delivery campaign ongoing.

Glass thin films are formed in a room temperature and atmospheric pressure environment. Due to its high reflowability, it is suitable for forming thin films on uneven surfaces. There is minimal loss of film materials, and it can be formed with inexpensive materials, allowing for cost reduction! It is ideal for forming protective films on glass alternative polycarbonate, screen protectors for mobile phones, and hydrophilic coatings. *Currently, we are holding an "Immediate Delivery Campaign"! We offer our equipment, including thin film formation devices, with astonishingly short delivery times. For more details, please download the catalog. **Features** - Thin film formation at room temperature and atmospheric pressure! - High reflowability makes it suitable for forming thin films on uneven surfaces! - Minimal loss of film materials! Can be formed with inexpensive materials! **Examples of Applications** - Formation of protective films on glass alternative polycarbonate! - Screen protectors for mobile phones! - Hydrophilic coatings! - Pre-treatment coatings for painting, printing, and coating! *For details on thin film formation technology or the immediate delivery campaign, please contact us or download the catalog from the link below.*

    Other processing machinesCoaterothers
名称未設定

"Glass coating 'thin film formation technology' at room temperature and atmospheric pressure [*Technical materials available!]”

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basic information

For information about thin film formation technology and details of the immediate delivery campaign, please contact us or download the catalog from the link below.

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Applications/Examples of results

【Fields】 <Electronics> - Semiconductors ... Front-end, Back-end - Substrates ... Substrate, Lead frame, Plating - Electronic components ... LED, MEMS, Optics, Sensors - Displays ... Organic EL, Electronic paper, Film displays - Solar cells, Fuel cells 【Materials】 - Metals, Resins, Films, Fibers, Powders <Automotive/Aerospace> - Car electronics, Power devices, Interior and exterior materials, Lighting <Biotechnology/Medical> Cell culture, Dental care, Non-woven fabrics, Sterilization, etc. 【Applications】 - Cleaning/Removal of organic substances/Surface modification/Improvement of hydrophilicity/Enhancement of adhesion effects/Pre-treatment for printing and painting 【Examples】 - Cleaning and pre-treatment for adhesion of glass - Cleaning and pre-treatment for adhesion of LSI - Cleaning and pre-treatment for adhesion of resin molded products - Substrate cleaning for solar cells and fuel cells - Terminal cleaning for organic EL, digital signage-related displays, and LCD substrates - Pre-treatment for wire bonding - Cleaning and pre-treatment for adhesion of films - Cleaning of MEMS, etc. - Pre-cleaning before plating - Pre-treatment for printing on paper - Cleaning of semiconductor plates - Cleaning of silicon wafers, etc.

Detailed information

  • 名称未設定

    【Same-Day Delivery (Next-Day Arrival) Campaign Now On】 Products such as pen-type atmospheric pressure plasma devices, tabletop vacuum plasma devices, and simple atmospheric pressure plasma devices are available for same-day shipping.

  • IPROS7497367793732031744.png

    Thin Film Formation Device Electrospray / SLEF-100

  • IPROS4475759744128159482.png

    Atmospheric pressure thin film formation device TEOS+O3-100

  • 製膜グラフ.png

    Film Formation Graph

  • 製膜ポンチ絵.png

    Film punching die

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Plasma treatment technology evaluation data

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Sakai Semiconductor Co., Ltd. Comprehensive Catalog Catalog

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Glass Coating 'Thin Film Formation Technology' at Room Temperature and Atmospheric Pressure [*Technical Documentation*]

Glass Coating 'Thin Film Formation Technology' at Room Temperature and Atmospheric Pressure [*Technical Documentation*]

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Notice of the "Asukuru Campaign" Now Available for Immediate Delivery

Notice of the "Asukuru Campaign" Now Available for Immediate Delivery

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魁半導体

魁半導体

Educational and Research Institutions

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KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.

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