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  5. Semiconductor inspection/test equipment
  6. Film Thickness Measurement Device "LF-1000"

Film Thickness Measurement Device "LF-1000"

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LF-1000

last updated:Dec 07, 2017

ラポールシステム
ラポールシステム
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Film thickness measurement device capable of measuring film thickness on wafer glass substrates and mirror substrates.

The "LF-1000" is a non-contact automatic film thickness measurement device equipped with a spectrometer and optical interference film thickness analysis software, enabling film thickness measurement by setting various parameters. This analysis software allows for non-contact automatic measurement and mapping of the thickness, refractive index, and absorption coefficient of transparent or translucent thin films by analyzing the interference waveforms from the surface of the thin film and the interface with the substrate. 【Features】 - Capable of measuring film thickness not only on wafers and glass substrates but also on other mirror-like substrates. - Various film thickness measurements can be performed by setting the optical constants of the film. - Excellent for measuring thin film oxide layers, SOI, EG films, color filters, etc. - Comes with an auto stage compatible with standard 3, 4, 5, 6, 8, and 12-inch wafers. - Loader specifications can also be accommodated as an option (consultation available for cassette/FOUP and number of ports). - Capable of measuring film thickness from thin films to thick films depending on the measurement head specifications. - GEM communication is optional. *For more details, please refer to the PDF materials or feel free to contact us.

    Semiconductor inspection/test equipmentOther measurement, recording and measuring instruments
image_26.jpg

Film Thickness Measurement Device "LF-1000"

image_26.jpg
image_26.jpg
  • Related Link - http://www.lapole.co.jp/html/maku.html

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【Basic Measurements】 ■Measurement Wavelength Range: 400nm to 1000(1700)nm (wavelength range depends on specifications) ■Measurement Film Thickness Range: 150Å to 50(250)μm (measurement film thickness depends on specifications) ■Optical Constant Measurement Range: 1000Å to 5(10)μm (measurement range depends on specifications) ■Measurement Time: Within 0.3 to 3 seconds (varies by film type) ■Repeatability: Within ±10Å or ±0.3%, whichever is larger *For more details, please refer to the PDF document or feel free to contact us.

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【Usage】 ■Semiconductor products  ・Photoresist, oxide films, nitride films *For more details, please refer to the PDF document or feel free to contact us.

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Film Thickness Measurement Device LF1000

Film Thickness Measurement Device LF1000

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Rapport System Co., Ltd. Company Profile

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ラポールシステム

ラポールシステム

Industrial Electrical Equipment

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Our company, though with limited capabilities, aims to expand beyond the current fields of electronics and mechatronics, and we aspire to contribute to the development of the next generation by creating systems that are fundamentally operated by humans as the main characters, while continuously delivering products that embody this commitment to the world.

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