This is a compact evaporation source compatible with UHV. It is characterized by excellent thin film control with a deposition rate at the monolayer level.
This is a compact evaporation source compatible with ultra-high vacuum. It is a type of electron impact heating evaporation source. It achieves evaporation by irradiating electrons generated from a thermionic cathode onto the evaporation material through electrostatic field convergence. Compared to magnetic field convergence type electron impact heating, it is smaller in size. It is characterized by excellent thin film controllability with a deposition rate at the monolayer level.
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This is a compact evaporation source compatible with ultra-high vacuum. It is a type of electron impact heating evaporation source. It achieves evaporation by irradiating electrons generated from a thermionic cathode onto the evaporation material through electrostatic field convergence. It is smaller compared to magnetic field convergence type electron impact heating. It is characterized by excellent thin film controllability with a deposition rate at the monolayer level.
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Applications/Examples of results
Production of high melting point metal films, fabrication of multilayer films (simultaneous co-deposition of multiple components is also possible) Fabrication of low-dimensional structure samples
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Have you ever experienced that even when you devise original experimental equipment, it is difficult to convey your intentions to the manufacturer? In experiments using a vacuum, I believe that "vacuum" often merely provides an essential environment for the experimental system. However, many constraints arise from the use of "vacuum," requiring various innovations in the design of the system. Our service is characterized by a complete system that proposes scientific requirements using engineering methods and actually manufactures and establishes the system.