Film Continuous Deposition Device
Device for continuously forming films from roll-shaped film ■□■Features■□■ ■Compatible with sputtering, EB, and resistance heating deposition ■Tension pickup feedback control ■Cold trap for film release gas exhaust ■Differential exhaust system (optional installation) ■Substrate cleaning mechanism ■Resistance value transmittance monitoring mechanism ■Deposition roller cooling refrigerant system ■Supports continuous film formation on both sides (see image on the right) ■Roll width, roll diameter, and winding speed are negotiable ■Winding control with independent control of UW, W, and CR ■For custom-made semiconductor manufacturing equipment, scientific instruments, and accessories, please leave it to us. For details, please contact us.
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basic information
Device for continuously forming films from roll-shaped film ■□■Features■□■ ■Compatible with sputtering, EB, and resistance heating deposition ■Tension pickup feedback control ■Cold trap for film release gas exhaust ■Differential exhaust system (optional installation) ■Substrate cleaning mechanism ■Resistance value transmittance monitoring mechanism ■Film forming roller cooling refrigerant system ■Supports continuous film formation on both sides (see image on the right) ■Roll width, roll diameter, and winding speed are negotiable ■Winding control with independent control of UW, W, and CR ■For custom-made semiconductor manufacturing equipment and scientific instruments and accessories, please leave it to us. For details, please contact us.
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Applications/Examples of results
■□■Applications■□■ With the expansion of products targeting flexible substrates such as organic EL and touch panels, a wide range of application fields is expected.
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