Sputter deposition unit
Sputtering film deposition unit equipped with a magnetron sputtering source and substrate rotation mechanism 【Features】 ○ Achieves excellent film thickness distribution ○ Capable of switching between DC sputtering and RF sputtering ○ Allows deposition of different types of films by incorporating two types of sputtering sources ○ Equipped with reverse sputtering function for substrate cleaning and etching ○ Prevents contamination and dust generation by adopting a two-motion shutter ● For other functions and details, please download the catalog.
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Sputtering film deposition unit equipped with a magnetron sputter source and substrate rotation mechanism 【Features】 ○ Achieves excellent film thickness distribution ○ Capable of switching between DC sputtering and RF sputtering ○ By incorporating two types of sputter sources, different types of films can be deposited ○ Equipped with reverse sputtering function for substrate cleaning and etching ○ Adopts a two-motion shutter to prevent contamination and dust generation ● For other functions and details, please download the catalog.
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The name of the new organization, Maple Co., Ltd., which aims to achieve development through a new stage in the field of precision processing and assembly, embodies the fundamental policy of "organizations are people" that has been inherited from the past, as well as the concept of "people think, people create." Make People. "Creating people" along with "people create." This attitude embedded in our company name symbolizes the way we aspire to shape our organization and business in the future.