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  6. Exhaust gas treatment and dust removal device - Wet scrubber Panacea

Exhaust gas treatment and dust removal device - Wet scrubber Panacea

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Panacea

last updated:Jul 03, 2023

東設 本社ヘッドオフィス
東設 本社ヘッドオフィス
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Efficiently removes toxic gases and powders (by-products) emitted from dry etching, CVD, and epitaxial growth processes using only water.

We have a wealth of delivery experience to major semiconductor and flat panel manufacturers! ■Feature 1: Suppression of carcinogenic substances It is possible to suppress carcinogenic substances emitted from combustion abatement systems. ■Feature 2: Cl2 abatement efficiency of over 99% using only water This achieves a dramatic reduction in water supply costs through the use of recycled water, as well as a significant reduction in the amount of NaOH used. ■Feature 3: Improved yield of production equipment It is possible to significantly reduce the downtime of production equipment by improving the maintenance cycle of combustion abatement systems. ■Feature 4: Extensive delivery experience to LCD factories We have delivery experience not only in Japan but also to LCD factories primarily in Taiwan and China.

    Hazardous material processing
EDO-P-500V-DFH-T2_04_1.png

Exhaust gas treatment and dust removal device - Wet scrubber Panacea

EDO-P-500V-DFH-T2_04_1.png
EDO-P-500V-DFH-T2_04_1.png
  • Related Link - https://www.tosetz.com/scrubber

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Using a high-efficiency mixer, we eliminate halogen gases such as chlorine contained in exhaust gases generated in processes like dry etching and CVD in semiconductor and LCD factories, as well as powder byproducts, using only water.

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■Purpose: - Removal of gases emitted from process equipment such as dry etching, CVD, and epitaxial growth, as well as removal of powders (by-products). - Pre-treatment before combustion abatement systems (improving maintenance cycles of combustion abatement systems, thereby reducing downtime of production equipment), suppression of carcinogenic substances. ■Target Gases: Cl2, HF, HCl, CVD combustion exhaust gases, powders (by-products). ■Toxic Gas Abatement Achievements: Achieved over 99% abatement of halogen gases such as Cl2 and F2 emitted from dry etching equipment using only water. ■By-product and Powder (2.5μm) Removal Achievements: Achieved over 99% removal of by-products and powders (2.5µm) generated in dry etching equipment. ■Running Cost Reduction Achievements: Significantly reduced running costs through abatement using factory-recycled water without the use of chemicals.

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Tosetsu Co., Ltd. Exhaust Gas Treatment and Dust Removal Equipment - Japanese Version

Tosetsu Co., Ltd. Exhaust Gas Treatment and Dust Removal Equipment - Japanese Version

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東設

東設 本社ヘッドオフィス

Electronic Components and Semiconductors

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Tosetsu is a development-oriented equipment venture that provides equipment primarily for semiconductor, electronic device, and LCD manufacturers, including "automatic electroplating/non-electroplating plating equipment," "exhaust gas treatment equipment," "wet process equipment," and "degasification systems." In addition to design development and manufacturing sales, we also offer process support & consulting, demonstration, prototyping, contract processing, and maintenance modification services. We look forward to your contact with Tosetsu, a venture that loves free thinking.

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