Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

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last updated：Mar 12, 2025

This is a method for inorganic element analysis using inductively coupled plasma (ICP) as the excitation source.

ICP-MS allows for relatively easy preparation of standard samples that are difficult to produce for solid analysis, as it analyzes solutions. Therefore, it is frequently used for accurately quantifying trace inorganic elements in solutions. - It can detect the lowest concentrations (ppt or sub-ppt levels) due to its high sensitivity and low background, making it the most effective instrument for inorganic element analysis. (*: ppt: 10^-12 g/g) - It allows for flexible preparation of standard samples (standard solutions) that serve as a reference for quantitative analysis, resulting in lower uncertainty in the results. - It enables qualitative analysis by measuring many elements of the periodic table simultaneously. Additionally, it has a wide dynamic range, allowing for simultaneous analysis of major and trace components.

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basic information

ICP-MS is a method for measuring the ion intensity of specific mass-to-charge ratios (m/z). Argon plasma is commonly used as the ion source. Argon plasma is generated by flowing argon through a quartz triple tube wrapped with an induction coil carrying high-frequency current, resulting in very high gas and electron temperatures, allowing for over 90% ionization for many elements. Many metals are introduced into the mass spectrometer as +1 charged ions. Naturally occurring elements have a constant isotopic composition, so qualitative analysis of the contained elements can be performed by scanning the ion intensity appearing at each m/z. Additionally, by utilizing the relationship between ion intensity and the amount of contained elements, quantitative analysis can be conducted by comparing the ion intensity of a sample with that of a standard solution of known concentration.

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Applications/Examples of results

- Evaluation of metal contamination on the surface of Si wafers - Assessment of the amount of metal impurities contained in thin films (such as SiO2 films) - Contamination assessment of clean rooms - Evaluation of metal impurities contained in solutions (ultrapure water, high-purity reagents) - Assessment of metal impurities contained in powders and bulk materials (such as Si and quartz) - Composition analysis of thin films (such as oxide films and metal films) - Composition evaluation of alloys

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Please consult with us first. ★ We will start by proposing an analysis plan ★ We can, of course, meet at your company for discussions. We will carefully explain the analysis results and leave no questions unanswered. Please contact us at 03-3749-2525 or info@mst.or.jp!
We will hold a visiting seminar. ★ We offer free seminars with engineers tailored to our customers' needs ★ Depending on your requests, we will introduce analysis techniques and explain analysis data. ◆ Example seminar content - A broad explanation of MST's analysis methods - A detailed explanation of specific analysis methods from the principles - Explanation of the analysis data requested by the customer Please contact us at 03-3749-2525 or info@mst.or.jp!