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  5. Plasma Generator
  6. Bipolar pulse power supply (vacuum tube switch method)

Bipolar pulse power supply (vacuum tube switch method)

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last updated:Feb 14, 2019

栗田製作所 本社・京都事業部
栗田製作所 本社・京都事業部
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Achieving stable discharge in vacuum tubes.

Both poles use vacuum tubes, allowing for stable plasma generation.

    Ion implantation equipmentPlasma Generatorpower supply
hbp2.jpg

Bipolar pulse power supply (vacuum tube switch method)

hbp2.jpg
hbp2.jpg
  • Related Link - http://pekuris.co.jp/product/category.php?c=1
  • Special site - Product/service details - https://pr.mono.ipros.com/pekuris/product/

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basic information

- The adoption of high-durability vacuum tubes has enabled fast rise times and micro-pulses. - It is possible to control pulses for both polarities. - Of course, unipolar usage is also possible.

Price information

It varies depending on the specifications, so please contact us.

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Applications/Examples of results

- Ion implantation device power supply - Pulse bias power supply - Insulation breakdown test power supply - Vacuum process power supply

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Model number overview
PVB-20K05A Output voltage: 2 to -20kV, Output current: 0 to 5Ap, Frequency: SINGLE to 5kHz, Pulse width: 1 to 20μs, DUTY: 2% or less, Rise time: 1μs or less, Fall time: dependent on load impedance, Size: 600(W) × 730(D) × 1680(H)
PVB-20K10A Output voltage: 2 to -20kV, Output current: 0 to -10Ap, Frequency: SINGLE to 5kHz, Pulse width: 1 to 20μs, DUTY: 2% or less, Rise time: 1μs or less, Fall time: dependent on load impedance, Size: 600(W) × 730(D) × 1680(H)
PVB-20K50A Output voltage: 2 to -20kV, Output current: 0 to 50Ap, Frequency: SINGLE to 5kHz, Pulse width: 1 to 20μs, DUTY: 3% or less, Rise time: (-)200ns to (+)1μs or less, Fall time: dependent on load impedance, Size: 850(W) × 940(D) × 1730(H)

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Kurita Manufacturing Co., Ltd. Company Profile

Kurita Manufacturing Co., Ltd. Company Profile

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栗田製作所

栗田製作所 本社・京都事業部

Industrial Electrical Equipment

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By applying the pulse power technology we have cultivated over many years, we will surely meet your company's needs with the development of various newly developed plasma control power supplies and surface treatment equipment.

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