List of Scientific and Physics Equipment products
- classification：Scientific and Physics Equipment
9946～9990 item / All 33645 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.
- Other safety and hygiene products
Processing time and processing conditions can be easily changed using the touch panel!
- Heating device
A new steam convection oven that guarantees excellent uniformity even under maximum load!
- Heating device
We will widely accommodate the creation of a variety of steamed products!
- Heating device
To chemical companies that manufacture highly toxic substances, hazardous materials, fragrant raw materials with odors, and solvents that may oxidize!
- Stainless steel container
We propose the most suitable model according to your usage needs!! We have a variety of movable conveyors available.
- Crusher
Are you struggling with contamination? This heat exchanger maximizes heat transfer area through innovative design and allows for easy disassembly and cleaning by anyone.
- Concentration Equipment
- Beverage Production Equipment
- Other machine elements
Always clean, fully washable mixer, free from oil and grease.
- Mixer/agitator
Move the mixer with the power of water! Since it doesn't use air, the air is clean, and because it doesn't use electricity, it is a safe and reliable mixer that is environmentally friendly.
- Mixer/agitator
Crusher manufacturer develops! Energy-saving with direct energy transmission.
- Crusher
New power module equipped with SiC MOSFET - EKOHEAT2
- Heating device
The tubeless heat exchanger is an innovative heat exchanger with a spiral flow path, making it easy to disassemble and clean, and allowing for space-saving installation.
- Emulsifier/Disperser
- Fine grinding machine
- Other physicochemical equipment
When used as a transport tray, it effectively protects the contents! With its low slip function, it excels in blocking properties!
- Plastic utensils and containers
- others
Strong in handling large items with well-equipped facilities such as large heat treatment furnaces and large shot blasting machines.
- Heating device
- Painting Machine
- Processing Contract
![[Presentation of Materials] Value E...](https://image.mono.ipros.com/public/product/image/e7d/2000567729/IPROS55584449244459034306.png?w=280&h=280){kind=small}
Introducing a white paper that outlines the features and benefits of zinc die casting!
- Other surface treatment equipment
A detailed introduction to the basic knowledge of "blow molding" using diagrams!
- Plastic utensils and containers
![New Type Disk Atomizer [Sharpegg]](https://image.mono.ipros.com/public/product/image/f88/2000426517/IPROS80063311428999588323.jpeg?w=280&h=280){kind=small}
Achieving a sharp particle size distribution!
- Drying Equipment
Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.
- Heating device
A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.
- Heating device
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800°C (Graphite, C/C Composite)
- Ceramic Heater
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
It is optimal as hydrogen gas for analysis machines, fuel cells, and chemical reactions.
- Other laboratory equipment and containers
![[Nanofurnace] BWS-NANO Thermal CVD ...](https://image.mono.ipros.com/public/product/image/0d0/2000191194/IPROS99314670218218380543.jpeg?w=280&h=280){kind=small}
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Introducing the Thermocera Japan research and development experimental furnace. It can be utilized for material development such as fuel cells and ceramics, as well as ultra-high temperature experimen...
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Removal of impurities to below 1 ppb! NuPure gas purifier that does not require a heater or power supply.
- Other physicochemical equipment
Peace of mind by your side. Evolved into a wearable device at just 45g.
- Gas Generator
Efficient direct heating through radiative heat transfer with wavelengths from 3μm to 1000μm.
- Heating device
Efficiently heats almost all substances except metals! Also for the drying process in semiconductor and liquid crystal panel manufacturing!
- Heating device
Adopts a titanium case with excellent corrosion resistance!
- Heating device
We support the drying of electronic devices and various types of printing and painting inks!
- Heating device
It's a special material that doesn't generate dust, so it's safe for use in precision equipment manufacturing environments!
- Other heaters
Magnetized ceramic heater born from years of experience!
- Ceramic Heater
Cleanroom-compatible type! Made with special materials that do not generate dust, ensuring safety even in precision equipment manufacturing environments.
- Heating device
Ideal for drying processes of electronic devices such as semiconductors and LCD glass!
- Heating device
Solve cleaning problems with baking soda blasting! Ideal for removing mold deposits and carbon sludge!
- Other cleaning machines
Notice of Participation in the 22nd International Auto Aftermarket EXPO 2025
The "International Auto Aftermarket EXPO 2025" will be held from February 26 (Wednesday) to 28 (Friday), 2025, at Tokyo Big Sight (East Halls 5 and 6). We will be exhibiting a variety of automotive machine tools handled by Matsuki Co., Ltd. Booth number: 5205 (East Hall 5) We sincerely look forward to your visit!
A company specialized in the manufacturing of resin containers! Engaged in product planning, development, and production.
- plastic
- Plastic utensils and containers
The temperature resistance is -30°C to 90°C! We offer two types: hard type and lightweight type.
- Plastic utensils and containers
![Hyperlinked Drum [100L Drum] [Valve...](https://image.mono.ipros.com/public/product/image/13b/2000500391/IPROS23438988397142151145.png?w=280&h=280){kind=small}
Completely sealed special container, wash-free stainless steel drum, returnable drum, SDGs.
- Other cleaning machines
![Hyperlinked Drum [200L Drum] [Valve...](https://image.mono.ipros.com/public/product/image/717/2001192132/IPROS83405747222415089799.png?w=280&h=280){kind=small}
Completely sealed special container, wash-free stainless steel drum, returnable drum, SDGs.
- Other cleaning machines
Troubles caused by lactic acid bacteria in food factories are troublesome. Long-term use of substances like hypochlorous acid has rendered agents such as acid-resistant lactic acid bacteria ineffectiv...
- Ultraviolet irradiation equipment
- Food environmental hygiene/contamination prevention equipment
- Food Cleaning Equipment