List of Electric furnace products
- classification：Electric furnace
61～75 item / All 517 items
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
We provide development and design technology for heating furnaces and heating systems with 30 years of experience in drawing furnaces and vitrification furnaces for optical fibers.
- Industrial Furnace
- Electric furnace
- Semiconductor inspection/test equipment
Conveyor-type far infrared heating furnace
- Electric furnace
AGV + hot air circulation batch furnace
- Electric furnace
Linking a continuous batch furnace with FA (automation equipment for labor-saving).
- Electric furnace
Rapid heating with high-temperature, high-flow hot air! A high-temperature hot air preheater furnace that can be easily made at low cost.
- Heating device
- Other heaters
- Electric furnace
Using a blower as an air source, it discharges hot air at 600℃! It is suitable for production lines that require a large volume of hot air.
- Heating device
- Other heaters
- Electric furnace
Ideal for fine local heating and low flow heating! Maximum output of a super compact hot air heater at 600℃.
- Heating device
- Other heaters
- Electric furnace
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A small hot air heater that blows out hot air at a maximum of 800℃! Here are five tips for selection.
- Heating device
- Other heaters
- Electric furnace
Ideal for heat treatment of guide wires! Space-saving and energy-saving are achievable through the miniaturization of the furnace body.
- Heating device
- Other heaters
- Electric furnace
We would like to introduce the technical advisory services provided by the D&T Lab.
- Glass
- Coater
- Electric furnace