List of Electric furnace products
- classification：Electric furnace
76～90 item / All 517 items
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
The bestselling heat treatment furnace "High Shifter" has evolved further with the latest features!
- Industrial Furnace
- Electric furnace
- Other surface treatment equipment
Consistent performance to meet various drying needs!
- Heating device
- Drying Equipment
- Electric furnace
An easy-to-use tabletop electric furnace for everyone!
- Electric furnace
Utilizing hydrogen gas, stainless steel bright treatment is possible!
- stainless
- Annealing furnace
- Electric furnace
For joining metal products, flux-free brazing in a non-oxidizing furnace is optimal!
- Electric furnace
- Other processing machines
A tempering furnace for molds and tools that utilizes steel and extends lifespan.
- Electric furnace
- Press Dies
Gas carburizing furnace for multi-variety, small-batch production.
- Other machine tools
- Electric furnace
- Other cutting tools
Electric muffle furnace capable of rapid heating.
- Electric furnace
A safe and high-performance electric muffle furnace with good maintainability.
- Electric furnace
Easy-to-operate practical type electric muffle furnace.
- Electric furnace
High-output near-infrared heater! Excellent workability, suitable for high-temperature heating and PET stretching!
- Other heaters
- Heating device
- Electric furnace
High-speed heating to 900°C within tens of seconds! High energy density can also be achieved.
- Other heaters
- Heating device
- Electric furnace
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
- Annealing furnace
- Heating device
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Effective utilization of thermal energy is possible! It can accurately heat materials in shapes such as cylindrical or flat plates.
- Heating device
- Electric furnace