CVD, PECVD horizontal furnace device "EVAD series"
Equipped with a flow management system! Processing of powders at high temperatures using CVD/PECVD is possible.
The "EVAD Series" is a CVD and PECVD horizontal furnace device capable of synthesizing and forming films from gas, vapor, liquid, and solid raw materials. It controls temperature distribution through single-zone and multi-zone configurations, and allows for high-temperature CVD/PECVD processing of powders using a high-quality stainless steel chamber with a rotation mechanism. The PLASMICON control system supports fully automated processes and data storage. 【Features】 ■ Equipped with the FLOCON series flow management system ■ Capable of incorporating the ICP plasma source from the PLUME series ■ Capable of synthesizing and forming films from gas, vapor, liquid, and solid raw materials ■ Temperature distribution control through single-zone and multi-zone configurations *For more details, please refer to the PDF document or feel free to contact us.
- 企業：ハイテック・システムズ
- 価格：Other
