Drying Furnace
Drying Furnace
Drying Furnace
- Company：台技工業設備股份有限公司 TANGTECK EQUIPMENT INC 台灣桃園縣 TAIWAN
- Price：Other
Furnace(center) - List of Manufacturers, Suppliers, Companies and Products
Furnace Product List
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High Temperature Firing Furnace
High Temp. Continuous Firing Furnace
High Temperature Continuous Firing Furnace(Muffle-less Furnace)
- Company：台技工業設備股份有限公司 TANGTECK EQUIPMENT INC 台灣桃園縣 TAIWAN
- Price：Other
N2 reflow -SMT REFLOW
N2 reflow device N2 reflow - SMT REFLOW
N2 reflow -SMT REFLOW
- Company：台技工業設備股份有限公司 TANGTECK EQUIPMENT INC 台灣桃園縣 TAIWAN
- Price：Other
"IR Series Concentrated Light Heating Furnace" Ultra-fast Heating and Cooling, Energy-saving, Compact
Rapid heating at approximately 50°C/sec using focused light heating method, with the possibility of rapid cooling when the heating lamp is turned off. Compatible with various atmospheres.
The "IR Series" (IR Series) of focusing heating furnaces manufactured by Yokokura Seisakusho, used by various research institutions around the world, is an IR image furnace that utilizes near-infrared focusing heating. It features a clean environmental structure that allows for ultra-fast heating and cooling. The product lineup includes the "IR-HP (6 Parabolic Radiation)," which dramatically expands the temperature distribution area compared to conventional heating furnaces with rapid heating and cooling from six directions; the "IR-QP (4 Elliptical Shared Focusing)," which offers double the temperature distribution area and rapid heating compared to conventional heating furnaces with rapid heating and cooling from four directions; and the "IR-TP (2 Elliptical Shared)," which enables microscopic observation compared to conventional heating furnaces with rapid heating and cooling from two directions. 【Main Features】 - Clean, energy-efficient, high performance - Vacuum and gas replacement + observation - High-speed heating with low power (1500°C in 30 seconds with only 4kW) - Heater uses tungsten filament with a high heating temperature of 3400K - Watt density is 10 to 20 times higher than nichrome heaters - Real-time temperature control available - Compact size For more details, please contact us or refer to the catalog.
- Company：米倉製作所
- Price：Other
Centrotherm Ultra High Temperature Bulk Annealing Furnace
By achieving ultra-high temperature treatment and excellent temperature uniformity, batch processing of boule ingots and wafers is possible, minimizing defects and dislocations.
To improve the yield of wide bandgap semiconductor devices, it is necessary to minimize defects and dislocations caused by stress. One of the methods to achieve this is through ultra-high temperature thermal treatment of semiconductor crystals. The c.CRYSCOO HTA high-temperature annealing furnace has been developed to significantly enhance productivity in the value chain from bulk crystals of wide bandgap semiconductors to devices. With excellent temperature control (maximum temperature of 2200°C), uniformity, and low cross-contamination, the c.CRYSCOO HTA demonstrates superior performance compared to conventional furnaces. It is capable of simultaneously processing more than 10 boule ingots or over 100 unprocessed wafers.
- Company：伯東 本社
- Price：Other
Centrosarm Vacuum Solder Reflow Oven
This is a batch-type vacuum reflow furnace compatible with voidless and fluxless reflow. We offer a variety of lineups that support everything from development to mass production.
In conventional atmospheric reflow, there are approximately 20% void areas remaining in the solder, which leads to a deterioration in joint strength. The batch-type vacuum reflow furnace "c.VACUNITE series" from Centrolsam (Germany) can reduce the void areas to less than 2% by using vacuum. Additionally, it can accommodate fluxless reflow by using 100% hydrogen or reducing effect gases such as formic acid. As an option, it also supports plasma cleaning of the bonding surface using MW plasma.
- Company：伯東 本社
- Price：Other
![[Market Report] Vacuum Furnace Market](https://image.mono.ipros.com/public/product/image/2db/2001166691/IPROS14843591892697773589.jpeg?w=280&h=280)
[Market Report] Vacuum Furnace Market
Global vacuum furnace market expected to grow: Market size projected to increase at a CAGR of 3.2% by 2031.
The global vacuum furnace market is expected to achieve steady growth from 2022 to 2031. Market revenue is projected to increase from 963 million USD in 2022 to 1.2798 billion USD by 2031, with a forecasted average annual growth rate of 3.2%. Factors driving the market: Industrial demand: Vacuum furnaces are required across various industrial sectors, including automotive, aerospace, energy, and semiconductor industries. They are particularly widely used in applications such as surface modification of materials and thin film production. Technological innovation: Innovations in vacuum furnace technology have enabled more efficient heat treatment and material processing, promoting market growth. New applications are being developed, such as uniform heat treatment at high temperatures and the production of fine thin films. Interest in sustainability: Material processing and manufacturing processes using vacuum furnaces have the advantages of being environmentally friendly and energy-efficient. As a result, the growing interest in sustainability is supporting market growth. For application methods, please check the [PDF download] button or apply directly through the related links.
- Company：Panorama Data Insights Ltd.
- Price：Other
