High-pressure pulse jet DP-Gun for cleaning masks, glass, and wafers.
If the pressure is the same, the water usage is 1/3; if the flow rate is the same, the pressure is 3 times; with a lower flow rate, there are repeated impacts. For removing slurry after mask and glass cleaning wafer polishing.
A cleaning nozzle unit that requires less water and is less likely to form a water film, which can be retrofitted to existing equipment. A cleaning nozzle that operates at a maximum of 30Hz. A pump that generates high-pressure water of 5 to 10 MPa. A combination of control units. Conventional continuous spraying applies pressure over a self-created water film, which tends to increase cleaning power = increase pressure = increase flow rate, resulting in a thicker water film. However, the DP-Gun uses intermittent spraying, which means that even at the same pressure (impact), the flow rate is lower, making it less likely to form a water film, and the sprayed water directly impacts the target object. By repeatedly applying intermittent spray impacts, it demonstrates excellent cleaning effects for removing foreign substances from the items being cleaned, cleaning masks, and cleaning three-dimensional objects (such as narrow grooves and complex shapes) like cassettes. The pump unit achieves stable water pressure control with minimal waste water during pressure adjustment by performing feedback control that matches flow rate changes due to nozzle opening and closing. *Please consult us regarding spraying a fixed amount of liquid and measurement + spray application. *Nozzles and pumps require regular maintenance.
- Company：テクニカルフィット
- Price：Other
