Microfabrication, research and development, industrial high-power ultrashort pulse laser PHAROS
Simultaneously achieving high output and high energy of femtosecond lasers, enabling high-quality and high-precision fine processing at high speed due to high repetition operation and stable emission direction.
Excellent beam quality, stable emission direction, and low running costs make it ideal for fine processing and micromachining. Equipped with pulse width and output variable functions, as well as pulse-on-demand capabilities, it allows for easy changes to laser irradiation conditions, making it perfect for application development and equipment integration. Additionally, its high pulse repetition frequency and high average output contribute to improved S/N and significant reductions in measurement time, benefiting the fields of physics and research and development. By combining PHAROS (high average output of 20W @ 1MHz) and ORPHEUS (OPA) with a wavelength extension unit, it enables wavelength variability up to 16μm, making it suitable for spectral analysis and more. Furthermore, high-output, high-energy types (20W, 4mJ/pulse @ 3kHz) and ultra-short pulse width types (>100fs) have been added, making it ideal for various processing, application development, and equipment integration. A high-output ultra-short pulse (femtosecond) laser has achieved significant miniaturization and low power consumption through direct excitation of laser diodes. It features pulse width and output variable functions, as well as pulse-on-demand capabilities, allowing for easy changes to laser irradiation conditions.
- Company：フォトテクニカ
- Price：Other
