1～3 item / All 3 items
Semiconductors, liquid crystals, electronic components, precision instruments, etc., are ideal for drying in a dust-free environment.
Using a heat-resistant HEPA filter, it maintains an internal cleanliness class of 100 at a maximum temperature of 250°C. The use of an inverter and internal slitters has equalized the air velocity distribution, achieving high-precision temperature distribution.
Achieving both cleanliness and an N2 atmosphere. Comprehensive safety measures, including low oxygen sensors, are in place.
It is optimal for processes that require low oxygen during heat treatment even in clean ovens. By linking the oxygen concentration meter (PPM・%) with the programmed temperature controller, it is possible to set the heating and cooling programs while detecting the oxygen concentration. Options include atmosphere oxygen concentration detection alarms, door locks, and high-temperature specifications of 250°C, among others.
Heat treatment furnace optimal for heat treatment in a low oxygen atmosphere.
Supports high temperatures up to 600℃. Ideal for heat treatment in a low-oxygen atmosphere using N2 purging and for drying workpieces containing highly explosive solvents.
