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High-Power RF Ion Source "ISG-180"

It is a high-output RF ion source that achieves a wide range and stable discharge.

It enables stable discharge over a wide range and can be used for various applications, from improving adhesion from non-shift films of optical filters to resin substrates. Our unique approach allows for reliable ignition and stable discharge performance. 【Features】 ○ High-output ion source with beam current of 1500mA / beam voltage of 1500V / ion current density of over 100μA/cm² ○ Achieves uniformity of ion current density distribution within ±10% (measured with the 1300 and 1550 devices) at high power → Measurement results from Sapio-1300, limited to specified conditions by Showa Vacuum Co., Ltd. ○ Adoption of an auto-matcher for the neutralizer to ensure reliable ignition performance and stabilization ○ The use of a newly developed collector electrode (patent pending) enables high output with an emission current of 2500mA → Prevents particle generation due to charge-up For more details, please contact us or download the catalog.

  • Ion implantation equipment

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