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This is a cylindrical ITO sputtering target made by Yumicoa, a pioneer in cylindrical ITO targets.
Features: - Composition: Of course, 90wt% In2O3 - 10wt% SnO2, but we can flexibly accommodate SnO2 composition ratios from 1wt% to 20wt%. - Can be manufactured up to 670 mm in length without division. - Available in flat and disc shapes.
We offer high-quality cylindrical targets, planar targets, and deposition materials for sputtering equipment at reasonable prices.
The following methods will be used to produce cylindrical targets. 1. Method: Integrated extrusion of melting materials Typical materials: Ti, Al, Cu Advantages: No risk of breaking, can rotate at low speeds Disadvantages: No high-purity products available 2. Method: Plasma spray Typical materials: Si, Ag, ZnAl, etc. Advantages: Relatively low risk of breaking, inexpensive Disadvantages: Difficult to achieve high-purity products above 5N, prone to defects, takes time to start up Note: Initial startup time can be shortened depending on the surface finishing method 3. Method: Cold spray Typical materials: Ag, etc. Advantages: Relatively low risk of breaking, can be sprayed directly onto used targets. Disadvantages: More expensive than plasma spray method. Takes time to start up. Note: Same as above 2 4. Method: Indium bonding of cast targets Typical materials: Special alloys, etc. Advantages: High-purity products are possible. Disadvantages: Risk of arcing from cuts. Can break or melt indium at low rotation speeds. Expensive. Low power input limit. 5. Method: Indium bonding of sintered targets Typical materials: ITO, AZO, etc. Advantages: High-purity products are possible. No restrictions on materials. Disadvantages: Same as above 4.
