Last Updated： Aggregation Period:Oct 01, 2025～Oct 28, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Oct 01, 2025～Oct 28, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Oct 01, 2025～Oct 28, 2025
This ranking is based on the number of page views on our site.
1～15 item / All 15 items
Koshibu Precision Co., Ltd. "Thin Film Products" General Catalog
This is an announcement for the "Koshibu Precision Co., Ltd. 'Thin Film Products' Comprehensive Catalog." ■□■Contents■□■ ■ Laser Direct Drawing Device Standard Scale ■ Photomask ■ Rotary Encoder Slit Plate ■ Optical Reticle ■ Thin Film Production Equipment ● For more details, please download the catalog or contact us.
Photo masks used in various fields. We provide suitable products tailored to our customers' needs.
At Nippon Filcon, we support almost all mask sizes currently in use. Based on vertical and horizontal lines, we can accommodate line and space down to a minimum of 0.5µm. In practice, the resolvable line width varies depending on the mask size, so we will provide a response regarding feasibility after design confirmation. Please feel free to contact us when you need assistance. 【Features】 ■ Supports almost all mask sizes currently in use ■ Custom sizes can be achieved by cutting glass ■ We also handle sizes larger than 10", accommodating up to a maximum of 813mm x 813mm ■ Based on vertical and horizontal lines, we can accommodate line and space down to a minimum of 0.5µm *For more details, please refer to the related link page or feel free to contact us.
For now, this! You can understand it in just 5 swipes! The basics of photomasks that beginners can’t ask about anymore!
"Understanding the Basics of Photomasks in 5 Swipes for Beginners" This document is a helpful resource for those who want to learn the basics of photomasks. It provides clear explanations using diagrams and illustrations, making it easy to understand in just five swipes! [Perfect for these situations!] ◆ I need explanatory materials for young employees with limited knowledge... ◆ I just transferred and want to gather information... ◆ It's hard to ask basic questions within the company at this point... [About Our Company] We offer high-quality and precise photomasks (glass masks), screen masks, and metal masks at short lead times and low prices. If you have any issues with semiconductor-related mask products, please feel free to contact us. *This document can be viewed via "PDF Download." *If you have any other questions, please don't hesitate to reach out.
[Technical Data Release] Addressing Electrostatic Issues in the Manufacturing Sites of the Electrical, Electronics, and Semiconductor Industries! Introducing Methods for Charge and Electrostatic Discharge (ESD) Countermeasures with Examples.
This document explains the mechanism of static electricity using the example of Cr glass masks and introduces four recommended countermeasures! By reading this, you can solve issues related to static electricity such as "discomfort during work, component damage, and defects caused by dust accumulation." It is particularly recommended for those in the manufacturing sector of the electrical, electronics, and semiconductor industries. [Contents] ■ What happens if you do not take measures against static electricity? ■ Why does static destruction occur with Cr glass masks? ■ What patterns are likely to cause it? ■ How to prevent static destruction ■ We also introduce "Cr glass masks for static destruction prevention" that make it less likely to occur. ⇒ We have compiled know-how that only professionals in photomasks can understand. [About Us] Takeda Tokyo Process Service provides high-quality and precise photomasks (glass masks), screen masks, and metal masks at short delivery times and low prices. If you have any issues with semiconductor-related mask products, please feel free to contact us. * This document can be viewed via "PDF Download." * If you have any other questions, please do not hesitate to contact us.
Micro-blasting processing that achieves high-precision fine processing for glass, silicon, ceramics, and various metals. A summary of its applications for glass masks.
At Takeda Tokyo Process Service [Fine Process Division], we offer micro-blasting processing for glass masks. ~ Currently, we are publishing a technical document titled "Micro-Blasting Processing and Its Application to Glass Masks"! ~ You can view it immediately from the [PDF Download] link below. "Micro-blasting processing" is a method that uses compressed air to inject fine particles at high speed and in a controlled manner onto the workpiece, achieving high-precision micro-processing through the principle of brittle fracture. *Processing targets: glass (blue plates, quartz), silicon, ceramics, various metals, etc. 【We can meet requests like these! Examples of processing for glass masks】(Excerpt from the document) ● I want to improve the visibility of the camera... → Improved with surface roughening for high contrast! ● It takes too long to align the equipment... → Improved with creative solutions utilizing drilling! ● I want to expose using a glass mask after component mounting... → Solved with recessed processing on the glass mask! ⇒ For details, please download the document and refer to the PDF. *This document can be viewed from the [PDF Download] link. *If you have any other questions, please feel free to contact us.
Photomask using advanced pattern processing technology and the latest equipment.
The photomasks provided by Equa are primarily drawn using the latest equipment that utilizes lasers as the light source. With years of experience in precision photolithography technology and Equa's unique shape processing technology, we meet the diverse needs of our customers in fields such as electronics, optical components, scales, and displays. Equa supports the realization of your images and concepts by creating data from drawings. 【Features】 ○ Supported data: DXF, DWG, GBX, GDS II, and image data such as BMP, TIF, etc. ○ Pattern shapes: Supports straight lines, circles, arcs, as well as sine waves, spirals, and random pattern arrangements. ○ Applications: Precision photolithography for sensors, displays, encoders, semiconductor packages, etc. ○ Shape correction: Flexible shape correction that matches the process. For more details, please contact us or download the catalog.
This is a photomask drawn using the latest equipment that uses a laser as the light source.
A photomask is a master plate used for exposing patterns onto wafers, glass substrates, printed circuit boards, metal plates, and other materials in the production of electronic circuits, display devices, optical components, and precision machinery. The patterns drawn on photomasks are used in many electronic products, semiconductors, televisions, smartphones, noise filters, scales, and network-related products. The photomasks provided by Equa are primarily drawn using the latest equipment that uses lasers as the light source. Equa creates data from drawings to support the realization of customers' images and concepts. 【Features】 - Master plate for exposure - Drawn using the latest equipment with lasers as the light source - Accommodates diverse needs - Patterns for circuit boards and optical components designed using CAD - Types of substrates: Two types of glass substrates: soda-lime and synthetic quartz, and the film is PET For more details, please contact us or download the catalog.
Providing high-quality photomasks with short delivery times and low prices.
We provide high-precision and high-quality photomasks through a process built by combining high-precision laser drawing equipment, a highly controlled clean environment, and years of accumulated know-how. Our thoroughly streamlined process achieves reduced manufacturing costs and shortened lead times. This allows us to maintain high quality while also offering competitive low prices and the capability for short delivery times, with delivery in as little as one day. Additionally, we are committed to improving quality further by significantly enhancing our equipment, including cleaning and inspection devices, to meet the increasingly sophisticated demands of our customers. We can accommodate a wide range of needs, from inexpensive mass production copy masks to reticles with pellicles. We will provide optimal proposals based on your applications and requirements, so please feel free to contact us for more details.
A mask shop that provides high-quality class photomasks "quickly," "cheaply," and "easily."
This document introduces the photomasks from Toyo Seimitsu Kogyo. We utilize various resources, including strictly managed clean rooms, high-spec drawing equipment, automated developing and cleaning devices, as well as numerous inspection and measurement devices, to meet these quality requirements. We also focus on delivery times and cost management, achieving both the shortest delivery time of one day and cost performance. [Contents (partial)] ■ Process image diagram ■ Photomask standard specifications ■ Drawing examples ■ Inspection and quality assurance system *For more details, please refer to the PDF document or feel free to contact us.
It's too late to ask now! What is a photomask? Here, we introduce its applications and manufacturing process! With a long history and cutting-edge technology, it achieves high reliability and high precision.
A "photomask" is a tool used in the manufacturing of electronic devices (semiconductors), displays, printed circuit boards, micro-machines/MEMS, and serves as the master for patterning. To put it in photographic terms, it acts like "negative film," while the substrate that forms electronic circuits corresponds to "photo paper." Our company provides highly reliable and high-precision photomasks made possible by our long history and cutting-edge technology. Please feel free to contact us when you need assistance. 【Applications (partial)】 ■ Electronic devices (semiconductors/integrated circuits) such as CPUs and memory ■ Discrete semiconductors with single functions, such as transistors and capacitors ■ Light-receiving and emitting elements such as CCD/CMOS image sensors and LEDs ■ Printed circuit boards such as motherboards ■ Image display devices such as LCDs and OLEDs *For more details, please refer to the related link page or feel free to contact us.
Large photomasks, including high-precision chrome masks. Coating processing is also possible.
Mesh Corporation offers large photomasks that require the highest level of image quality and positional accuracy. We have a lineup that includes chrome masks, high-definition chrome masks, as well as film masks and emulsion masks. Chrome masks can be treated with a fluorine coating, and emulsion masks can be provided with a hard-coated protective finish. 【Product Specifications (Excerpt)】 ■ Chrome Masks - Material: Soda lime / Synthetic quartz - Substrate size: Up to 1200×1700mm - Drawing size: 1060×1650mm ■ High-Definition Chrome Masks - Material: Soda lime / Synthetic quartz - Substrate size: Up to 1400×1500mm - Drawing size: 1350x1450mm *For more details, please refer to the PDF document or feel free to contact us.
Reduce humidity impact with glass substrates, achieving high dimensional stability and resolution. For CSP, FC-CSP, thin film chip components, etc.!
The "Photo Mask - Emulsion Mask" has a glass substrate, making it less susceptible to humidity, resulting in high dimensional stability and excellent resolution. It can be used for applications such as CSP, FC-CSP, FPC, thin film chip components, and various other packages, as well as for touch panel formation. *For more details, please refer to the PDF document or feel free to contact us.
Achieving high-precision design molding! With excellent durability and fine detail, it is suitable for semiconductor chips, substrate mounting, and various package molding.
The "Photo Mask - Chrome Mask -" is effective for high durability and fine detail, enabling high-precision design formation. It can be used for various applications such as CSP, FC-CSP, FPC, thin film chip components, magnetic heads, and other types of packages, as well as for display and touch panel formation. 【Specifications (excerpt)】 ■ Maximum mask size (mm): 800×800×12t ■ Glass material: Soda lime (SL) / Quartz (QZ) ■ Film quality: 2-layer low-reflective chrome film / Others ■ Film thickness (μm): 100–160 / Others ■ Influence of environmental temperature: 0.8μm/℃/100mm (SL) 0.05μm/℃/100mm (QZ) ■ Influence of environmental humidity: None *For more details, please refer to the PDF document or feel free to contact us.
We provide high-quality photomasks through a consistent production system that encompasses everything from CAD design to mask manufacturing!
Takeda Printing Co., Ltd. Fine Process Division and Tokyo Process Service Co., Ltd. merged in April 2023 and have started anew as "Takeda Tokyo Process Service Co., Ltd."! Our photomasks meet various customer demands by implementing strict quality control for each process and achieving short delivery times and low costs using the latest equipment. 【Product Lineup】 ■ Chrome Glass Masks Capable of high-resolution and high-precision image formation, with high mask durability. ■ Emulsion Glass Masks Less susceptible to environmental impacts than film masks, with good dimensional stability and resolution. ■ Film Masks High cost performance, capable of forming fine images of approximately 20-30μm. 【Optional Processing】 Surface Coating / Coating for Chrome Glass Masks / Chrome Glass Masks with Pellicle 【Specialty Products】 ● Chrome Glass Masks for Electrostatic Discharge Protection ● Calibration Plates *For more details, please refer to the PDF document or feel free to contact us.
Free useful materials available! A professional in semiconductor-related masks explains "The Basics of Photomasks" and "No More Worries About Static Electricity! Three Countermeasures."
At Takeda Tokyo Process Service's Fine Process Division, we provide high-quality and precise photomasks (glass masks), screen masks, and metal masks at short lead times and low prices. Based on years of expertise, we have compiled useful information regarding semiconductor masks! ▼ Published Document 1: "Understand the Basics of Photomasks in 5 Swipes!" - A helpful resource for those who want to learn the basics of photomasks - Clearly explained using diagrams and illustrations - Understandable in just 5 swipes ▼ Published Document 2: "Three Measures to No Longer Worry About Static Electricity Recommended by Takeda Tokyo Process Service!" - Explanation of the mechanism behind static electricity (electrostatic discharge) using Cr glass masks as an example - Introduction of three countermeasures against electrostatic discharge *This document can be freely downloaded from the "PDF Download" section below. *If you have any other questions, please feel free to contact us.
