Photomask using advanced pattern processing technology and the latest equipment.
The photomasks provided by Equa are primarily drawn using the latest equipment that utilizes lasers as the light source. With years of experience in precision photolithography technology and Equa's unique shape processing technology, we meet the diverse needs of our customers in fields such as electronics, optical components, scales, and displays. Equa supports the realization of your images and concepts by creating data from drawings. 【Features】 ○ Supported data: DXF, DWG, GBX, GDS II, and image data such as BMP, TIF, etc. ○ Pattern shapes: Supports straight lines, circles, arcs, as well as sine waves, spirals, and random pattern arrangements. ○ Applications: Precision photolithography for sensors, displays, encoders, semiconductor packages, etc. ○ Shape correction: Flexible shape correction that matches the process. For more details, please contact us or download the catalog.
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basic information
【Specifications】 [High-Precision Photo Mask] ○ Maximum Photo Mask: 9X9 inches ○ Maximum Drawing Area: 200X200 mm ○ Minimum Line Width: 1 μm ○ Mask Substrate: Quartz, Soda Lime [Large Size Photo Mask] ○ Maximum Photo Mask: 711X813 mm ○ Maximum Drawing Area: 700X800 mm ○ Minimum Line Width: 5 μm ○ Mask Substrate: Quartz, Soda Lime [Film Mask] ○ Maximum Photo Mask: 2450X1612 mm ○ Maximum Drawing Area: 2350X1512 mm ○ Minimum Line Width: 20 μm ● For more details, please contact us or download the catalog.
Price information
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Applications/Examples of results
For more details, please contact us or download the catalog.
Detailed information
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Data Processing Please share your vision with us. Equa can create the desired pattern even from a simple rough sketch. Our experienced experts will utilize their long-developed shape processing and data correction techniques to create CAD data.
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The 2um dot pattern is used in various applications such as charts, LEDs, and optical filters.
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1um L/S The resolution of smooth curves requires advanced technology and is suitable for fine substrate circuits and wiring sections of network lines.
Company information
Equa Corporation's thin film products are created based on high-precision drawing equipment, advanced thin film formation technology, and glass processing technology. We accommodate small lots of fine photolithography products such as photomasks for steppers, photomasks for aligners, other general-purpose masks, encoders, focus plates, and resolution charts.
