This is a photomask drawn using the latest equipment that uses a laser as the light source.
A photomask is a master plate used for exposing patterns onto wafers, glass substrates, printed circuit boards, metal plates, and other materials in the production of electronic circuits, display devices, optical components, and precision machinery. The patterns drawn on photomasks are used in many electronic products, semiconductors, televisions, smartphones, noise filters, scales, and network-related products. The photomasks provided by Equa are primarily drawn using the latest equipment that uses lasers as the light source. Equa creates data from drawings to support the realization of customers' images and concepts. 【Features】 - Master plate for exposure - Drawn using the latest equipment with lasers as the light source - Accommodates diverse needs - Patterns for circuit boards and optical components designed using CAD - Types of substrates: Two types of glass substrates: soda-lime and synthetic quartz, and the film is PET For more details, please contact us or download the catalog.
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basic information
【Specifications】 [Type of Substrate] ○ Glass Substrate → Synthetic Quartz (Qz): Transmittance 90% / 200nm and above → Soda Lime (SL): Transmittance 83% / 380nm and above ○ Film Substrate → PET: Transmittance 90% / 200nm and above [Chrome Film] ○ The chrome thin film on the glass substrate has a two-layer structure → The first layer is pure chrome, and the second layer is chromium oxide ○ Types and Structure of Chrome Film → Chrome Mask: Low-reflection two-layer chrome film Optical density 3.0OD, reflectance about 10% / 436nm → Chrome Mask with Hard Coat Transparent resin is applied to the chrome film surface with a thickness of about 2-3um → Chrome Mask with Pellicle: A pellicle is attached to the surface of the chrome mask ● For more details, please contact us or download the catalog.
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Applications/Examples of results
【Applications】 ○ Printed circuit boards and IC package substrates ○ Display devices such as LCDs and touch panels ○ Optical filters ○ Optical waveguides ○ Scales and encoders ● For more details, please contact us or download the catalog.
Company information
Equa Corporation's thin film products are created based on high-precision drawing equipment, advanced thin film formation technology, and glass processing technology. We accommodate small lots of fine photolithography products such as photomasks for steppers, photomasks for aligners, other general-purpose masks, encoders, focus plates, and resolution charts.
