Electrostatic Photoresist "Elecoat EU-XC Series"
Formation of resist by electrophoretic method
It is a negative-type photoresist solution. The resist is formed using an electrophoretic method.
- Company：シミズ
- Price：Other
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Negative-type electrostatic photoresist
Electrodeposition process of negative-type photoresist to achieve high-precision plating areas.
The Erecote EU-XC process is a photoresist electrophoretic process that achieves high-precision partial plating on uneven surfaces and three-dimensional shapes. This electrophoretic resist has excellent chemical resistance and can be used as a resist for silver cyanide plating, as well as for gold plating and copper sulfate plating. It features excellent edge coverage and achieves high-precision developability. It is a negative-type electrophoretic photoresist that enables precise partial plating and can also be used as an etching resist.
- Company：シミズ
- Price：Other
![[Developed Product] Negative Type Anionic Electrophoretic Photoresist](https://image.mono.ipros.com/public/product/image/7c6/2001425387/IPROS60122774361252602580.png?w=280&h=280)
[Developed Product] Negative Type Anionic Electrophoretic Photoresist
It is a negative-type anion electrostatic photoresist!
Since it is an anionic electrophoretic negative-type photoresist, the developer and stripping solution will be alkaline. The developer and stripping solution are not specialized products.
- Company：ハニー化成
- Price：Other
What is photoresist for semiconductor manufacturing? A collection of basic knowledge.
An explanation of the basic knowledge of photoresist, which is essential for semiconductor manufacturing.
In the semiconductor manufacturing industry, a precise understanding and application of photoresist is essential for the formation of fine circuits. Particularly, the accuracy of circuit patterns is directly linked to the performance of semiconductor devices, making it important to grasp the characteristics and types of photoresist, as well as their roles in the process. Improper selection or use of photoresist can lead to reduced yield and quality issues with products. This page covers everything from the basic concepts of photoresist to the differences between negative and positive types, process images, coating methods, and the features of our electrodeposition resist, addressing any questions related to photoresist. 【Usage Scenarios】 - Circuit patterning in semiconductor manufacturing processes - Acquisition of basic knowledge about photoresist - Consideration of introducing electrodeposition resist 【Benefits of Introduction】 - Deepening understanding of photoresist - Support for appropriate photoresist selection - Streamlining manufacturing processes and improving quality
- Company：ハニー化成
- Price：Other
What is photoresist for robotics? A collection of basic knowledge.
Basic knowledge of photoresists useful for manufacturing small actuators.
In the field of robotics, particularly in the manufacturing of small actuators, precise circuit formation is required. The technology for accurately transferring fine patterns directly impacts the performance and reliability of actuators. Inappropriate selection or use of photoresist can lead to circuit defects and a decrease in product lifespan. Our collection of basic knowledge on photoresist supports optimal material selection and process design by deepening understanding from the fundamentals of photoresist in response to these challenges. 【Application Scenarios】 - Precise circuit pattern formation for small actuators - Micromachining in semiconductor manufacturing processes - Material evaluation during the research and development phase 【Benefits of Implementation】 - Improved accuracy in circuit formation - Maintenance of product reliability and performance - Increased efficiency in the development process
- Company：ハニー化成
- Price：Other
What is photoresist for MEMS? A collection of basic knowledge.
Fundamental knowledge of photoresist essential for microstructure processing in MEMS.
In the field of MEMS, high-precision pattern formation is required for microstructure processing. Particularly, understanding the properties of photoresists and selecting the appropriate ones are crucial for accurately creating fine circuits and structures. The use of inappropriate photoresists or errors in the process can potentially affect the reproducibility of microstructures and the performance of devices. This page explains the basic knowledge of photoresists, their types, process images, coating methods, and the features of our electrostatic resist, contributing to solving challenges in microstructure processing in the MEMS field. 【Application Scenarios】 - Prototyping and development of MEMS devices - Formation of fine circuit patterns - Product development requiring high-precision structural processing 【Benefits of Introduction】 - Acquisition of basic knowledge about photoresists - Promotion of understanding of negative and positive types - Visualization of process images - Understanding of the coating methods for liquid photoresists - Grasping the characteristics of electrostatic resist
- Company：ハニー化成
- Price：Other
What is photoresist for microelectronics? A collection of basic knowledge.
Explaining the basic knowledge of photoresist essential for high-density packaging.
In the microelectronics industry, particularly in high-density packaging, there is a demand for technologies that can accurately form fine circuit patterns. Photoresist plays a very important role in this microfabrication process as a photosensitive material that enables pattern formation through exposure. Inappropriate selection or use of photoresist can lead to a decrease in circuit accuracy and the occurrence of defects. Our company has been responding to our customers' advanced needs through the manufacturing and sales of electrodeposited resist. In light of the importance of providing information on the basic knowledge of photoresist, we have created this basic knowledge page. It explains the fundamental mechanisms of photoresist, the differences between negative and positive types, specific process images, and the application methods for liquid photoresist. Additionally, we also introduce the features of our electrodeposited resist, so please feel free to download the catalog. 【Usage Scenarios】 - Fine circuit patterning in semiconductor manufacturing - Manufacturing processes for high-density packaging substrates - Precision processing of electronic components 【Benefits of Implementation】 - Improved accuracy of circuit patterns - Stabilization of manufacturing processes - Enhanced product reliability
- Company：ハニー化成
- Price：Other
