Formation of resist by electrophoretic method
It is a negative-type photoresist solution. The resist is formed using an electrophoretic method.
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basic information
【Features】 ○ It is possible to form a resist on a three-dimensional structural substrate. ○ Precise control of film thickness is possible. ○ Excellent edge coverage. ○ Superior chemical resistance, compatible with cyanide-based plating solutions to electroless plating solutions. ○ Low tackiness. ● For other functions and details, please download the catalog or contact us.
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Company information
We develop, manufacture, and sell surface treatment chemicals based on electrodeposition paint. All of our electrodeposition paints are lead-free and tin-free. We offer a wide range of applications, from decorative purposes to functional uses. For functional purposes, we have options for electrical insulation (epoxy-based), heat resistance (polyimide-based), non-contamination (fluorine-based), and photoresist (alkali-resistant), among others. In the plating sector, we provide tungsten alloy plating with excellent release properties for glass and resin, as well as nickel plating processes with excellent solder wettability. We pursue the potential of surface treatment technology and aim to create added value for our customers. We have obtained ISO 14001 certification and ISO 9001 certification (for electrodeposition paint). For more details, please visit our website.
