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Advanced NIL Materials for AR/MR, Photonics Integration
As next-generation optical materials AR/MR displays Sensors Meta-optics Silicon photonics and more can be created using imprint technologies such as DOE, MLA, WLO, and waveguides.
UV-Curable Composites for NIL and Micro Optical Elements
- Solvent free, low shrinkage UV-curable resins - High Tg and excellent heat resistance (up to 300˚C/572˚F reflow compatible) - Adjustable refractive index (nD = 1.5 – 1.6) - High optical transparency and durability - Spin-coatable, imprintable formulations suitable for sub-100 nm patterns For more details, please refer to the brochure or contact us.
Resists for UV-NIL (via RIE)
It is a UV-NIL resist. It has excellent spin coating characteristics. It has excellent NIL characteristics. It has high etching resistance. ❖ No need for a primer treatment before coating. ❖ Easily forms a thin film with superior thickness uniformity by spin coating. ❖ Low volatility during vacuum defoaming on wafer. ❖ Low volatility during hot-air drying on wafer. For more details, please refer to the brochure or contact us.
