DLC coating and film formation method
I will explain the "ion source deposition," "PCVD," and "FAD" that we are conducting!
DLC film formation utilizes technologies such as PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition). Ion source deposition is a type of PVD where a filament is heated to ionize hydrocarbon gas using thermal electrons, which then collide with the substrate under a potential difference to create a coating. PCVD (Plasma Chemical Vapor Deposition) involves ionizing hydrocarbon gas in a plasma region and colliding it with the substrate under a potential difference to form a coating. FAD (Filtered Arc Deposition) uses a magnetic field filter to draw only ionized carbon into the substrate for film formation. [Film formation methods we employ] ■ Ion source deposition ■ PCVD (Plasma Chemical Vapor Deposition) ■ FAD (Filtered Arc Deposition) *For more details, please refer to the related links or feel free to contact us.
- Company:オンワード技研 本社
- Price:Other