Multi-source simultaneous magnetron sputtering device "FRS-HG Series"
Easy discharge operation! Compact design with automatic matching for RF power supply.
The "FRS-HG Series" is a multi-source simultaneous magnetron sputtering device equipped with dual-source/three-source simultaneous sputtering capabilities for research and development. Despite being a fixed type, it features a compact and stylish design. There are three film source introduction ports available, allowing for the installation of film sources that can synergize with sputtering, such as sputtering cathodes and arc plasma deposition sources. 【Features】 - Compact and stylish design despite being a fixed type - Auto-matching is employed for the RF power supply, making discharge operation easy - Simultaneous film deposition with two or three sources allows for fine-tuning of thin film functions and performance *For more details, please refer to the PDF materials or feel free to contact us.
- Company：FKDファクトリ
- Price：Other
