Magnetron sputtering device for high-precision optical filter film deposition
FHR Star EOSS Series
The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.
We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.
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basic information
Basic Specifications of the Device ■ Adoption of Cylinder-Type Cathodes and Targets ▶ The target has a long lifespan, with minimal variation in film deposition rate until the end of its lifespan. ■ Capable of Mounting Up to Four Cathodes ▶ Allows for the production of a wide range of optical characteristic filters through various combinations of targets. ■ Equipped with an Ion Source for Reactive Deposition ▶ Enables the deposition of oxide and nitride films on substrates through ion irradiation during the deposition process. ■ Film Deposition on Large Substrates ▶ Compatible with substrates up to 300mm or 280×330×50 mm in size (flat or curved). ▶ Substrate heating mechanisms can also be integrated.
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Applications/Examples of results
【Main Applications】 ■Anti-reflective coating ■Bandpass filter ■Edge filter ■Notch filter ■Dielectric mirror ■Dichroic mirror ■Beam splitter ■Polarizing filter ■Wearable display *For more details, please refer to the PDF document or feel free to contact us.
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| Model number | overview |
|---|---|
| FHR.Star.600-EOSS | High-performance magnetron sputtering device developed for precise optical filter film deposition |
| FHR.Star.500-EOSS | High-performance magnetron sputtering device developed for precise optical filter film deposition |
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Company information
For semiconductor, electronic devices, and optical thin film manufacturing equipment, come to us. Our company was established in March 2016 with the aim of providing agency services for several overseas manufacturers with advanced technologies related to vacuum processes, as well as maintenance services for these devices. Our product lineup includes a wide range of equipment such as sputtering, high-density plasma sources and pulse power supplies, ion beam etching and milling, ion beam sputtering, neutral cluster ion beam process equipment, organic material sublimation purification and film deposition equipment, various filters for liquids, and cleaning brushes, among others.
![[Example of Use] Sputtering Target Composite Material SiC/Si](https://image.mono.ipros.com/public/product/image/f42/2000180520/IPROS14162266355367390576.jpeg?w=280&h=280)
